CMP slurry for oxidation film engineering "ILD(TM) Series"
Fumed silica slurry for oxidation film engineering
The "ILD(TM) Series" is a CMP slurry for oxide films that uses fumed silica. It is an industry-standard slurry that achieves a high polishing rate and reduces scratches and impurities, which is difficult to achieve with conventional colloidal silica slurries, and can also be used for glass-epoxy polishing. [Overview] - Suitable for oxide film process polishing requiring low scratch performance - KOH/ammonia-based - Overwhelming reduction of metallic impurities - High mechanical polishing characteristics *For more details, please download the PDF or feel free to contact us.
- Company：アンカーテクノ
- Price：Other
